Home Page About Location Contact  Sitemap
Greek  
 
 
Photonics for Nanoapplications
Staff
Publications
Funding
Services


Photonics for Nano-applications
Facilities - Infrastructure
  • F 2 Molecular laser, 157 nm.
  • Excimer laser, 193, 248 nm.
  • 13-20, (50-110) nm Capillary Discharge Light Source.
  • Low temperature (LHe 10 0 K), X-UV (30-110 nm), VUV (110-200 nm), UV (200-400 nm), VIS (400-600 nm), Absorption Spectrometer.
  • Crystal Growth Chamber (Bridgmann-Stockbarger).
  • Mass Spectrometer (0-300 AMU).
  • Metallographic Optical Microscope
  • Atomic Force Microscope.
  • Magnetic Force Microscope.
  • Computer controlled (CCD included) 157 nm Laser Micromachining Station ~ 10 ì m resolution .
  • Ultra High Vacuum chamber (87 X 100 cm), (under Installation).
  • Alphastep 500IQ profilometer.
  • Acid wet bench.
  • Lightwave multimeter.
  • Two industrial grade optical tables.
  • Basic lithography set-up for electronic boards.
  • Generic electronic and RF instrumentation (e.g., power supplies, waveform generator, data acquisition).
  • Various opto-mechanical mounts.
  • Various optical elements and components.
  • Electronic workshop (supported by technician for home made devices).

 

 

 

 
 

 

  

 

  
 

 

    
       

 
   

Last Update: 29.09.2010
© National Hellenic Research Foundation (NHRF), 48 Vassileos Constantinou Ave., 11635 Athens, Greece, Tel. +302107273700, Fax. +302107246618